Hiroshi Okada

Title: Hiroshi Okada: Innovator in Semiconductor Technology

Introduction

Hiroshi Okada is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex problems in this area.

Latest Patents

One of his latest patents is titled "Method of determining impurity content and apparatus for the same." This method involves obtaining a first C-V curve prior to irradiation with light and a second C-V curve after the irradiation. It determines the amount of intra-film impurity ions in an insulating film based on these curves. Another notable patent is "Apparatus and method for electrical measurement of semiconductor wafers." This invention features a stage that includes a metal base and an anti-metal contamination film, which effectively protects the rear face of the semiconductor wafer from metal contamination.

Career Highlights

Hiroshi Okada is associated with Dainippon Screen Mfg. Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His work has significantly impacted the efficiency and reliability of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers such as Sadao Hirae and Motohiro Kono, contributing to various projects that enhance the capabilities of semiconductor technologies.

Conclusion

Hiroshi Okada's innovative patents and contributions to semiconductor technology reflect his expertise and commitment to advancing the field. His work continues to influence the industry and pave the way for future innovations.