Yaizu, Japan

Hiroshi Noge

This inventor holds 1 USPTO granted patent. Top assignee: Corning Incorporated. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Noge. Retrieved from https://idiyas.com/inventor/hiroshi-noge-o41wof1v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Hiroshi Noge: Optical Isolation Innovation

Introduction

Hiroshi Noge is an inventor associated with Yaizu, Japan, and Corning Incorporated. His patent work concerns optical communications, particularly a planar-type optical isolator designed to operate independently of polarization.

Latest Patents

Noge is credited with 1 patent: “Planar-Type Polarization Independent Optical Isolator.” The invention describes a substrate-based device with two mode splitters and a phase-shift region between them. The first splitter divides an incoming optical signal into two modes, while the second combines rotated modes to reconstruct the signal at the output. The phase-shift region includes both nonreciprocal and reciprocal sections. The device also separates reflected signals into modes, supporting optical isolation.

Career Highlights

Noge’s listed patent reflects work on planar optical components that manage incoming and reflected signals. His association with Corning Incorporated places this invention within the company’s broader field of materials and optical technologies.

Collaborations

Hiroki Takahashi is identified as Noge’s coworker. The available information does not specify whether Takahashi collaborated on this patent.

Conclusion

Hiroshi Noge’s patent describes a planar optical isolator that uses mode splitting and phase shifting to support polarization-independent signal handling.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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