Tokyo, Japan

Hiroshi Namai

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Somar Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Namai. Retrieved from https://idiyas.com/inventor/hiroshi-namai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hiroshi Namai: Inventor of a Black Light-Shielding Member.

Introduction

Hiroshi Namai is an inventor associated with Tokyo, Japan, and Somar Corporation. His listed patent focuses on a light-shielding component designed to combine low gloss, deep blackness, and good processability.

Latest Patents

Namai is credited with 1 patent: “Black Light Shielding Member.” The invention describes a light-shielding layer formed on at least one surface of a substrate. The layer contains black fine particles, low-refractive-index nanoparticles, and a resin composition. It specifies average particle sizes of 0.1 to 50 micrometers for the black particles and 1 to 200 nanometers for the nanoparticles. Porous carbon is identified as a preferred black material, while magnesium fluoride and silicon oxide are preferred nanoparticle materials.

Career Highlights

Namai’s listed patent reflects work on material composition and particle-size selection to achieve practical optical and processing properties. His professional affiliation is Somar Corporation.

Collaborations

Naoki Sakazume is identified as Namai’s coworker. The available information does not specify their roles in the patent or whether they collaborated on this invention.

Conclusion

Hiroshi Namai’s recorded invention is a black light-shielding member that combines selected particles and resin to target low gloss, high blackness, and processability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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