Kanazawa, Japan

Hiroshi Maeyama

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Fujitsu Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Maeyama. Retrieved from https://idiyas.com/inventor/hiroshi-maeyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Hiroshi Maeyama: Innovator in Authentication Technology

Introduction

Hiroshi Maeyama is a notable inventor based in Kanazawa, Japan. He has made significant contributions to the field of authentication technology. His innovative approach has led to the development of a unique method that enhances user experience and security.

Latest Patents

Hiroshi Maeyama holds a patent for an "Authentication processing method and system." This invention involves a plurality of authentication servers belonging to different domains, which are connected to achieve a Single Sign-On using two cookies in two management systems. This method streamlines the authentication process, making it more efficient and user-friendly.

Career Highlights

Hiroshi is currently employed at Fujitsu Corporation, a leading technology company known for its advancements in information technology and services. His work at Fujitsu has allowed him to explore and implement innovative solutions in the realm of authentication.

Collaborations

Hiroshi has collaborated with talented coworkers such as Takayoshi Kurita and Masafumi Kobayashi. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Hiroshi Maeyama's contributions to authentication technology exemplify the impact of innovation in enhancing security and user experience. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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