Location History:
- Nakakubiki-gun, JP (2004)
- Niigata, JP (2010)
Company Filing History:
2 out of 5,978 
1 out of 1,268 
Years Active: 2004-2010
Title: Innovations of Hiroshi Kubota: A Pioneer in Photomask Technology
Introduction
Hiroshi Kubota, a notable inventor based in Niigata, Japan, has made significant contributions to the field of photomask technology. With a total of two patents to his name, his work focuses on enhancing the performance and efficiency of photomasks, which play a crucial role in the semiconductor manufacturing process.
Latest Patents
Hiroshi Kubota's latest patents include innovative designs for a photomask blank, photomask, and the fabrication method thereof. His invention features a light-shielding film designed for exposure light that is formed on one principal plane of a transparent substrate made of quartz or similar materials, which serves as the foundation for the photomask. This light-shielding film not only functions as a traditional light-shielding element but also acts as an anti-reflection film. Remarkably, the total thickness of this film is 100 nm or less, with more than 70% of this thickness comprised of a chromium compound characterized by an optical density (OD) per unit thickness of 0.025 nm for light with a wavelength of 450 nm. Notably, when this photomask blank is employed for fabricating a mask intended for ArF exposure, the thickness and composition of the light-shielding film are meticulously selected to achieve an OD range of 1.2 to 2.3 for light with wavelengths of 193 or 248 nm.
Career Highlights
Hiroshi Kubota has garnered valuable experience through his professional journey at prominent companies, including Shin-Etsu Chemical Co., Ltd. and Toppan Printing Co., Ltd. His tenure at these organizations has enabled him to develop groundbreaking innovations related to photomasks and resist compositions.
Collaborations
Throughout his career, Hiroshi has collaborated with esteemed colleagues such as Takanobu Takeda and Jun Hatakeyama. Their joint efforts have contributed to advancements in photomask technology, further emphasizing the importance of teamwork in innovation.
Conclusion
Hiroshi Kubota's innovative work in the field of photomask technology showcases his dedication to improving the semiconductor manufacturing process. With his groundbreaking patents and collaborative spirit, he continues to influence the industry, highlighting the significant role of inventors in shaping the future of technology.