Akishima, Japan

Hiroshi Koguma


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Hiroshi Koguma: Innovator in Semiconductor Technology

Introduction

Hiroshi Koguma is a notable inventor based in Akishima, Japan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative approach to chip packaging. His work has led to advancements that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Hiroshi Koguma holds a patent for a semiconductor device that features a unique chip package technology. This technology utilizes thin film wiring from the chip to the package terminals, which increases line density and decreases parasitic capacitance. Additionally, it incorporates a thin film adhesion layer that improves heat conductivity between the package substrate and its sealing cap. The design employs a thin conductor film deposited along the element mounting surface of a sintered substrate, ensuring optimal performance.

Career Highlights

Throughout his career, Koguma has worked with prominent companies in the technology sector. He has been associated with Hitachi, Ltd. and Hitachi VLSI Engineering Corporation, where he contributed to various projects that pushed the boundaries of semiconductor technology. His expertise and innovative mindset have made him a valuable asset in these organizations.

Collaborations

Koguma has collaborated with several talented individuals in his field. Notable coworkers include Takayuki Okinaga and Shouji Matsugami, who have worked alongside him on various projects, further enhancing the impact of their collective efforts in semiconductor advancements.

Conclusion

Hiroshi Koguma's contributions to semiconductor technology exemplify the spirit of innovation. His patent for a semiconductor device showcases his commitment to improving technology and efficiency in the industry. His work continues to influence the field and inspire future advancements.

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