Urawa, Japan

Hiroshi Hondou

This inventor holds 1 USPTO granted patent. Top assignees: Adeka Argus Chemical Co., Ltd., Du Pont-Showa Denko Co., Ltd.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Hondou. Retrieved from https://idiyas.com/inventor/hiroshi-hondou

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Hiroshi Hondou: Innovator in Chloroprene Rubber Technology

Introduction

Hiroshi Hondou is a notable inventor based in Urawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of plasticizers for chloroprene rubber. His innovative work has led to advancements that benefit various industries.

Latest Patents

Hiroshi Hondou holds a patent for a plasticizer for chloroprene rubber and plasticized chloroprene rubber. This patent is represented by the general formula (I), showcasing his expertise in creating materials that enhance the properties of chloroprene rubber.

Career Highlights

Throughout his career, Hondou has worked with prominent companies such as Du Pont-Showa Denko Co., Ltd. and Adeka Argus Chemical Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in rubber technology.

Collaborations

Hiroshi Hondou has collaborated with esteemed colleagues, including Yasushi Hirose and Kenji Iijima. These partnerships have fostered a creative environment that has led to innovative solutions in the field.

Conclusion

Hiroshi Hondou's contributions to the development of plasticizers for chloroprene rubber highlight his role as an influential inventor. His work continues to impact the materials science industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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