Otsu, Japan

Hiroshi Hatakeyama

This inventor holds 1 USPTO granted patent. Top assignee: Nissha Printing Co., Ltd.. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroshi Hatakeyama. Retrieved from https://idiyas.com/inventor/hiroshi-hatakeyama-am4lc3gb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Hiroshi Hatakeyama: Innovator in Transparent Electrode Substrates

Introduction

Hiroshi Hatakeyama is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of transparent electrode substrates, which are essential in various electronic applications. His innovative work has led to the development of a patented technology that enhances the performance and efficiency of electronic devices.

Latest Patents

Hiroshi Hatakeyama holds a patent for the "Production of Transparent Electrode Substrate." This invention is crucial for improving the functionality of touch screens and other electronic displays. The patent showcases his expertise in materials science and engineering.

Career Highlights

Hatakeyama is associated with Nissha Printing Co., Ltd., a company known for its advancements in printing technology and electronic components. His role at Nissha has allowed him to collaborate with other talented professionals in the industry, furthering the company's innovative capabilities.

Collaborations

Some of his notable coworkers include Eiji Nakagawa and Masayuki Ogawa. Their combined efforts contribute to the ongoing research and development at Nissha, fostering an environment of creativity and innovation.

Conclusion

Hiroshi Hatakeyama's work in the production of transparent electrode substrates exemplifies the impact of innovation in technology. His contributions continue to influence the electronics industry, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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