Ibaraki, Japan

Hiroshi Andoh

USPTO Granted Patents = 2 


Average Co-Inventor Count = 1.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2016

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2 patents (USPTO):Explore Patents

Title: Hiroshi Andoh: Innovator in Liquid Discharge Detection Technology

Introduction

Hiroshi Andoh is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of liquid discharge detection technology. With a total of 2 patents, Andoh's work focuses on enhancing the efficiency and accuracy of image forming devices.

Latest Patents

Andoh's latest patents include a "Device and method for detecting state of discharged liquid droplet" and a "Liquid discharge state detection device and image forming apparatus." The first patent describes a device that detects the state of a liquid droplet discharged from nozzles. It utilizes a light emitting element to emit a light beam towards the droplet and employs light receiving elements to capture scattered light for analysis. The second patent outlines a similar detection device that includes an analyzer to detect scattered light with a specific polarization direction, enhancing the accuracy of liquid droplet state detection.

Career Highlights

Hiroshi Andoh is currently employed at Ricoh Company, Ltd., where he continues to innovate in the field of imaging technology. His work has contributed to advancements in the efficiency of image forming devices, making them more reliable and effective.

Collaborations

Andoh has collaborated with notable colleagues such as Hideharu Miki and Genichiro Kawamichi. Their combined expertise has fostered a productive environment for innovation and development within their projects.

Conclusion

Hiroshi Andoh's contributions to liquid discharge detection technology exemplify his commitment to innovation in the imaging field. His patents reflect a deep understanding of the complexities involved in liquid droplet detection, paving the way for future advancements.

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