Amagasaki, Japan

Hiroshi Abe


Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 70(Granted Patents)


Location History:

  • Takatsuki, JP (1990 - 1994)
  • Amagasaki, JP (1994 - 2000)

Company Filing History:


Years Active: 1990-2000

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4 patents (USPTO):Explore Patents

Title: Hiroshi Abe: Innovator in Resin Technology

Introduction

Hiroshi Abe is a prominent inventor based in Amagasaki, Japan. He has made significant contributions to the field of resin technology, holding a total of 4 patents. His innovative work focuses on developing materials with unique properties that enhance their functionality and application.

Latest Patents

One of Hiroshi Abe's latest patents is for a shape-recoverable resin foamed product. This product is formed of a resin with closed cells dispersed throughout. The resin exhibits a shape-recoverable property at ambient temperature, with a closed cell rate higher than 30% and a compression permanent set lower than 10%. This means that when the resin contracts, it can automatically recover its shape in at least one direction after a predetermined time without external stimulation. Another notable patent involves a sheet for covering a substrate and a method for producing a molding, showcasing his versatility in resin applications.

Career Highlights

Hiroshi Abe is associated with Sekisui Kagaku Kogyo Co., Ltd., a company known for its advancements in chemical products and materials. His work at this company has allowed him to push the boundaries of resin technology and contribute to various innovative solutions.

Collaborations

Throughout his career, Hiroshi has collaborated with talented individuals such as Akitaka Miyake and Yosuke Oshikawa. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Hiroshi Abe's contributions to resin technology exemplify the spirit of innovation. His patents reflect a commitment to advancing material science and improving product functionality. His work continues to inspire future developments in the field.

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