Fukaya, Japan

Hironori Ikezawa

This inventor holds 13 USPTO granted patents and 1 published patent application, primarily in Photolithography Systems. Top assignee: Nikon Corporation. Active years: 2004-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironori Ikezawa. Retrieved from https://idiyas.com/inventor/hironori-ikezawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 13 

% Patents Active = 15.4

Average Co-Inventor Count = 2.4

ph-index = 7

Forward Citations = 128(Granted Patents)


Company Filing History:


Years Active: 2004-2011

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Areas of Expertise:
Projection Optical System
Exposure System
Photolithography
Immersion Objective
Device Fabrication
Boundary Optical Element
Exposure Method
Production Method
13 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hironori Ikezawa

Introduction:

Hironori Ikezawa, a visionary inventor hailing from Fukaya, Japan, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents:

Ikezawa's latest patents focus on advancements in robotics and artificial intelligence, showcasing his commitment to pushing the boundaries of innovation in these fields.

Career Highlights:

With a career spanning over two decades, Ikezawa has established himself as a leading figure in the tech industry. His work has been recognized globally for its ingenuity and impact.

Collaborations:

Throughout his career, Ikezawa has collaborated with top research institutions and tech companies to bring his inventions to life. His ability to work across disciplines has led to the development of cutting-edge technologies.

Conclusion:

In conclusion, Hironori Ikezawa's relentless pursuit of innovation and his passion for creating technology that shapes the future make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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