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For the Inventor, By the Inventor

Chichibu, Japan

Hironori Atsumi

This inventor holds 4 USPTO granted patents and 3 published patent applications and 1 EPO patent. Top assignee: Showa Denko K.k.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironori Atsumi. Retrieved from https://idiyas.com/inventor/hironori-atsumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4 

% Patents Active = 100.0


Average Co-Inventor Count = 2.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:

goldMedal4 out of 1,961 
 
Showa Denko K.k.
 patents

Years Active: 2022

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4 patents (USPTO):Explore Patents
1. 11427929 - Wafer supporting mechanism, chemical vapor deposition apparatus, and epitaxial wafer manufacturing method (2022-08-30),
2. 11424147 - Deposition apparatus having particular arrangement of raw material supply port, partition plate, and opening for measuring a temperature (2022-08-23),
3. 11390949 - SiC chemical vapor deposition apparatus and method of manufacturing SiC epitaxial wafer (2022-07-19),
4. 11326275 - SiC epitaxial growth apparatus having purge gas supply ports which surround a vicinity of a raw material gas supply port (2022-05-10),

Title: Hironori Atsumi: Innovator in Wafer Technology

Introduction

Hironori Atsumi is a notable inventor based in Chichibu, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in wafer technology. With a total of 4 patents to his name, Atsumi's work has advanced the efficiency and effectiveness of wafer processing.

Latest Patents

Atsumi's latest patents include innovative technologies such as a wafer supporting mechanism, a chemical vapor deposition apparatus, and an epitaxial wafer manufacturing method. The wafer supporting mechanism features a supporting table and a movable part that enhances the transfer and film formation processes of wafers. The chemical vapor deposition apparatus is designed with a unique arrangement of a raw material supply port, a partition plate, and an opening for measuring the temperature of the wafer, optimizing the deposition process.

Career Highlights

Atsumi is currently employed at Showa Denko K.K., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in wafer technology has positioned him as a key player in advancing manufacturing processes.

Collaborations

Atsumi has collaborated with talented coworkers such as Naoto Ishibashi and Keisuke Fukada, contributing to various projects that enhance wafer technology.

Conclusion

Hironori Atsumi's innovative contributions to wafer technology have made a significant impact in the semiconductor industry. His patents reflect a commitment to improving manufacturing processes and advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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