Osaka, Japan

Hironori Aoki

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Osaka University. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironori Aoki. Retrieved from https://idiyas.com/inventor/hironori-aoki-y72c36a6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hironori Aoki: Innovator in Plasma Production Technology

Introduction: Hironori Aoki is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of plasma production, particularly through his innovative patent that enhances the efficiency of plasma generation.

Latest Patents: Aoki holds a patent for a "Plasma producing apparatus and method of plasma production." This invention focuses on producing plasma from a medium gas mass in an elongated shape. The apparatus includes electric field forming elements that create an electric field within the medium gas mass, facilitating partial discharge towards both sides along the longitudinal direction. This method allows for the stable production of plasma with high energy efficiency across a wide range of parameters.

Career Highlights: Aoki is affiliated with Osaka University, where he continues to advance research in plasma technology. His work has implications for various applications, including industrial processes and scientific research.

Collaborations: Aoki has collaborated with esteemed colleagues such as Katsuhisa Kitano and Satoshi Hamaguchi, contributing to the advancement of plasma production technologies.

Conclusion: Hironori Aoki's innovative work in plasma production exemplifies the potential for advancements in technology through dedicated research and collaboration. His contributions are paving the way for more efficient plasma generation methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…