Shunan, Japan

Hironobu Nagoh

This inventor holds 19 USPTO granted patents and 1 published patent application and 6 EPO patents, primarily in Photochromic Materials. Top assignee: Tokuyama Corporation. Active years: 1996-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironobu Nagoh. Retrieved from https://idiyas.com/inventor/hironobu-nagoh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19 

% Patents Active = 73.7

 

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 165(Granted Patents)


Location History:

  • Tsukuba, JP (1996)
  • Yamaguchi-ken, JP (2005)
  • Tokuyama, JP (1998 - 2006)
  • Yamaguchi, JP (2013)
  • Shunan, JP (2007 - 2015)

Company Filing History:


Years Active: 1996-2015

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Areas of Expertise:
Photochromic Optical Articles
Curable Composition
Chromene Compound
Photochromic Lens Substrate
Polymerizable Composition
Fulgimide Compound
Photochromic Layered Product
Optical Element
19 patents (USPTO):Explore Patents

Title: Hironobu Nagoh: Pioneering Inventor from Shunan, Japan

Introduction: Hironobu Nagoh is a renowned inventor hailing from Shunan, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Hironobu Nagoh holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Nagoh has worked with leading research institutions and tech companies, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Hironobu Nagoh has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and excellence in all his projects.

Conclusion: Hironobu Nagoh's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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