Tokyo, Japan

Hironari Takehara

This inventor holds 2 USPTO granted patents. Top assignee: The Furukawa Electric Co., Ltd.. Active years: 2003-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hironari Takehara. Retrieved from https://idiyas.com/inventor/hironari-takehara-pafssff0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Hironari Takehara: Innovator in GaN-based Field Effect Transistors

Introduction

Hironari Takehara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of GaN-based field effect transistors (FETs). With a total of 2 patents to his name, Takehara's work is recognized for its innovative approaches and practical applications.

Latest Patents

Takehara's latest patents include advancements in field effect transistors and their manufacturing methods. One notable invention is a GaN-based FET that features a sapphire substrate approximately 50 nm thick. This substrate supports an n-type GaN electron transit layer and an AlGaN electron supply layer, with n-type GaN contact regions positioned between these layers. A polyimide interlayer insulating film, about 3000 nm thick, is formed over these layers, incorporating contact holes for source, drain, and gate electrodes. Each electrode is constructed from a TaSi/Au layer, approximately 5000 nm thick. The source and drain electrodes are ohmic-connected to the n-type GaN contact regions, while the gate electrode interfaces with an SiO gate insulating film.

Another significant patent involves a semiconductor device designed as an integrated FET object. This device is characterized by a small effective area, low ON resistance during operation, high voltage resistance, and the capability for large-current drive. It consists of one or more FETs, each with a gate, source, and drain electrode, arranged side by side on a single plane. These FETs are stacked in blocks, with direct connections between the electrodes of the first and second blocks.

Career Highlights

Hironari Takehara is currently employed at Furukawa Electric Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has garnered attention for its potential to enhance the performance and efficiency of electronic devices.

Collaborations

Takehara has collaborated with notable colleagues, including Seikoh Yoshida and Takahiro Wada. Their combined expertise has contributed to the advancement of innovative technologies in the semiconductor field.

Conclusion

Hironari Takehara's contributions to the development of GaN-based field effect transistors highlight his role as a key innovator in semiconductor technology. His patents reflect a commitment to

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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