Sendai, Japan

Hiromichi Ogasawara

This inventor holds 1 USPTO granted patent. Top assignee: Chisso Corporation. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromichi Ogasawara. Retrieved from https://idiyas.com/inventor/hiromichi-ogasawara-temueaab

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Hiromichi Ogasawara: Innovator in Chemical Processes

Introduction

Hiromichi Ogasawara is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of chemistry, particularly in the production of chemical derivatives that are essential for various applications.

Latest Patents

Ogasawara holds a patent for a process for producing 1,3-dioxin-4-one derivatives. This innovative process involves reacting formyl Meldrum's acid with a lower aliphatic carbonyl compound, resulting in a high yield of useful starting raw materials for prostaglandins. The method operates at temperatures between 100°C to 120°C, while carefully adding the acid into the solvent, ensuring that the total quantity of acid added does not exceed 0.2 mol per liter of solvent.

Career Highlights

Ogasawara is associated with Chisso Corporation, where he has been able to apply his expertise in chemical processes. His work has contributed to advancements in the production of important chemical compounds.

Collaborations

He has collaborated with notable coworkers, including Chikara Kaneko and Masayuki Sato, enhancing the innovative capabilities within his team.

Conclusion

Hiromichi Ogasawara's contributions to chemical processes exemplify the impact of innovation in the field. His patent for producing 1,3-dioxin-4-one derivatives showcases his commitment to advancing chemical manufacturing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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