This inventor holds 1 USPTO granted patent. Top assignee: Denso Corporation. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Hiromi Ooniwa: Innovator in Wafer Technology
Introduction
Hiromi Ooniwa is a notable inventor based in Aichi-gun, Japan. He has made significant contributions to the field of wafer technology, particularly through his innovative patent that enhances the efficiency of wafer cutting and dividing methods.
Latest Patents
Ooniwa holds a patent for a "Wafer and wafer cutting and dividing method." This invention involves applying a laser beam to the interior of a wafer through its top surface. The method creates modified areas in multiple layers of modified area groups. Notably, the intervals of the modified areas in one layer differ from those in another layer, which is closer to the wafer's top surface. This innovative approach allows for more precise cutting and dividing of wafers, improving manufacturing processes.
Career Highlights
Hiromi Ooniwa is currently employed at Denso Corporation, a leading global automotive components manufacturer. His work at Denso has allowed him to apply his expertise in wafer technology to develop solutions that enhance product performance and efficiency.
Collaborations
Ooniwa collaborates with Muneo Tamura, a talented female engineer, at Denso Corporation. Their partnership exemplifies the importance of teamwork in driving innovation and achieving technological advancements.
Conclusion
Hiromi Ooniwa's contributions to wafer technology through his innovative patent demonstrate his commitment to advancing the field. His work at Denso Corporation and collaboration with Muneo Tamura highlight the collaborative spirit essential for innovation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
