Matsumoto, Japan

Hiromi Ono

This inventor holds 3 USPTO granted patents. Top assignee: Fuji Electric Co., Ltd.. Active years: 2015-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromi Ono. Retrieved from https://idiyas.com/inventor/hiromi-ono-jerse3i8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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3 patents (USPTO):Explore Patents

Title: Hiromi Ono: Innovator in Magnetic Recording Technology

Introduction

Hiromi Ono is a notable inventor based in Matsumoto, Japan. He has made significant contributions to the field of magnetic recording technology, holding a total of 3 patents. His innovative approaches have advanced the manufacturing methods for magnetic recording media.

Latest Patents

One of Hiromi Ono's latest patents is a manufacturing method for a magnetic recording medium. This method includes a magnetic layer, a lower protective layer, an upper protective layer, and a lubricating layer on a substrate. The total film thickness of the lower and upper protective layers is designed to be 2.5 nm or less. The process involves several steps: depositing the lower protective layer, performing oxygen plasma treatment on it, depositing the upper protective layer, and finally, performing nitrogen plasma treatment on the upper protective layer. It is preferable that both protective layers are formed of a carbon-based material, ideally diamond-like carbon. Additionally, the contact angle of the lower protective layer with respect to water in the atmosphere is recommended to be 25° or less.

Another significant patent by Ono is related to a magnetic recording medium itself. This medium consists of a substrate with a magnetic layer, a protective layer composed of an amorphous metal, a carbon layer, and a lubricating layer. The protective layer has a thickness ranging from 1.0 nm to 2.5 nm and includes a metal selected from a specific group in an amorphous state. The carbon layer, which is formed on the amorphous metal layer, includes nitrogen atoms, with a specific atomic percentage of nitrogen to total atoms.

Career Highlights

Hiromi Ono is currently employed at Fuji Electric Co., Ltd., where he continues to innovate in the field of magnetic recording technology. His work has been instrumental in developing advanced manufacturing techniques that enhance the performance and reliability of magnetic recording media.

Collaborations

Throughout his career, Hiromi Ono has collaborated with talented individuals such as Tomonori Katano and Katsumi Taniguchi. These collaborations have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Hiromi Ono's contributions to magnetic recording technology exemplify the impact of innovative thinking in the industry. His patents and ongoing work at Fuji Electric Co., Ltd. continue to shape

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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