Kawagoe, Japan

Hiromi Kawada

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Hiromi Kawada: Innovator in Semiconductor Cleaning Solutions

Introduction

Hiromi Kawada is a notable inventor based in Kawagoe, Japan. She has made significant contributions to the field of semiconductor technology, particularly in the development of cleaning agents for semiconductor substrates. Her innovative work has led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Hiromi Kawada holds a patent for a cleaning agent specifically designed for semiconductor substrates. The patent, titled "Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface," addresses the need for superior corrosion resistance of tungsten wiring and effective removal of polishing fines such as silica or alumina. This cleaning agent is particularly effective after a chemical mechanical polishing process, ensuring that the surface of the semiconductor substrate, especially silicon oxide films, is thoroughly cleaned. The formulation includes a phosphonic acid-based chelating agent, a primary or secondary monoamine with alkyl or hydroxyalkyl groups, and water, with a pH level maintained between 6 and 7.

Career Highlights

Hiromi Kawada is currently employed at Wako Pure Chemical Industries, Inc., where she continues to innovate in the field of semiconductor cleaning solutions. Her work has been instrumental in improving the quality and reliability of semiconductor devices, which are critical in various electronic applications.

Collaborations

Throughout her career, Hiromi has collaborated with esteemed colleagues such as Hironori Mizuta and Tsuneaki Maesawa. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Hiromi Kawada's contributions to semiconductor cleaning technology exemplify her dedication to innovation and excellence. Her patented cleaning agent represents a significant advancement in the semiconductor industry, showcasing her expertise and commitment to improving manufacturing processes.

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