Hiroko Shiroguchi is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. Her work focuses on innovative manufacturing methods that enhance the efficiency and cost-effectiveness of semiconductor devices.

Latest Patents

Among her latest patents are groundbreaking inventions such as a substrate having a film pattern and a manufacturing method of the same, a manufacturing method of semiconductor devices, liquid crystal televisions, and EL televisions. These inventions provide a manufacturing method of a substrate that includes an insulating film, a semiconductor film, and a conductive film, all achieved through simple steps. The methods she developed are designed to be low in cost while maintaining high throughput and yield. Specifically, her invention involves forming a first protective film with low wettability on a substrate, followed by applying a material with high wettability on the outer edge of a first mask pattern, resulting in the formation of a film pattern and a substrate with that pattern.

Career Highlights

Hiroko Shiroguchi is currently associated with Semiconductor Energy Laboratory Co., Ltd., where she continues to push the boundaries of semiconductor technology. Her innovative approaches have garnered attention in the industry, making her a key figure in her field.

Collaborations

She has collaborated with notable colleagues such as Gen Fujii and Shinji Maekawa, contributing to various projects that advance semiconductor research and development.

Conclusion

Hiroko Shiroguchi's contributions to semiconductor technology through her patents and innovative methods highlight her role as a leading inventor in her field. Her work not only enhances manufacturing processes but also paves the way for future advancements in technology.

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