Tokyo, Japan

Hiroki Oyama

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Nec Corporation. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Oyama. Retrieved from https://idiyas.com/inventor/hiroki-oyama-spqdz3gh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Hiroki Oyama: Innovator in Communication Control Systems

Introduction

Hiroki Oyama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of communication technology. His innovative work has led to the development of a unique communication control system.

Latest Patents

Hiroki Oyama holds 1 patent for his invention titled "Communication control system and communication control method." This system is designed to connect to a first apparatus capable of data communication using a specific protocol via a network. The system manages sessions through a session management protocol, ensuring efficient data communication.

Career Highlights

Hiroki Oyama is currently employed at NEC Corporation, a leading technology company. His role involves advancing communication technologies and contributing to innovative solutions in the industry. His expertise has been instrumental in the development of new systems that enhance data communication.

Collaborations

Hiroki has collaborated with notable colleagues, including Tomoki Murakami and Hiroshi Kurihara. Their teamwork has fostered an environment of innovation and creativity, leading to advancements in communication technologies.

Conclusion

Hiroki Oyama's contributions to communication control systems exemplify his dedication to innovation. His work continues to influence the field and pave the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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