KANAGAWA, Japan

Hiroki Oomori

This inventor holds 1 USPTO granted patent. Top assignee: Sony Semiconductor Solutions Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Oomori. Retrieved from https://idiyas.com/inventor/hiroki-oomori

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hiroki Oomori and Solid-State Imaging Technology.

Introduction

Hiroki Oomori is an inventor associated with Sony Semiconductor Solutions Corporation in Kanagawa, Japan. His patent work includes technology for solid-state imaging apparatuses designed to reduce uneven reflection of incident light.

Latest Patents

Oomori is named on one patent: Solid-state imaging apparatus, manufacturing method thereof, and electronic equipment. The invention describes an imaging element chip bonded to a device chip. The imaging element chip includes a semiconductor substrate and a wiring layer on the side opposite the light-incident surface. In areas of the pixel region not occupied by the device chip, the wiring layer includes dummy metal wiring. This arrangement is intended to suppress nonuniform reflection of incident light. Oomori is credited with 1 patent.

Career Highlights

The available information connects Oomori’s patent activity with Sony Semiconductor Solutions Corporation and semiconductor imaging technology. His patent addresses both an imaging apparatus and a method for manufacturing it, as well as electronic equipment incorporating the technology.

Collaborations

Nobutoshi Fujii is identified as Oomori’s coworker. The provided information does not specify their roles or describe a particular joint project.

Conclusion

Hiroki Oomori’s documented patent contribution focuses on using dummy metal wiring in a bonded-chip imaging structure to help control incident-light reflection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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