Kakegawa, Japan

Hiroki Okada

This inventor holds 1 USPTO granted patent. Top assignee: Cataler Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Okada. Retrieved from https://idiyas.com/inventor/hiroki-okada-myo4kui0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hiroki Okada: Innovator in Exhaust Gas Purification Technology

Introduction

Hiroki Okada is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of exhaust gas purification technology. His innovative approach has led to the development of a unique method for manufacturing exhaust gas purification catalyst devices.

Latest Patents

Hiroki Okada holds 1 patent for his invention titled "Method for manufacturing exhaust gas purification catalyst device." This patent outlines a method that includes several steps: placing a catalyst coating layer-forming coating liquid on a honeycomb substrate, transferring the substrate to a suction station, and suctioning the substrate to coat the cell walls with the coating liquid. The process is designed to enhance the efficiency of exhaust gas purification.

Career Highlights

Hiroki Okada is currently employed at Cataler Corporation, where he continues to work on advancements in catalyst technology. His expertise in this area has positioned him as a valuable asset to the company and the industry.

Collaborations

Hiroki collaborates with talented coworkers, including Kazuhiro Mizoguchi and Hitomi Suzuki. Their combined efforts contribute to the innovative projects at Cataler Corporation.

Conclusion

Hiroki Okada's work in exhaust gas purification technology exemplifies the impact of innovation in environmental solutions. His contributions are paving the way for more efficient and effective methods in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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