Joetsu, Japan

Hiroki Nonaka

This inventor holds 3 USPTO granted patents. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Nonaka. Retrieved from https://idiyas.com/inventor/hiroki-nonaka-nkeo58dq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Inventor Hiroki Nonaka: Pioneering Innovations in Resist Materials

Introduction

Hiroki Nonaka is a distinguished inventor hailing from Joetsu, Japan, known for his significant contributions to the field of resist materials and pattern formation processes. With three patents to his name, Nonaka has established a reputation for innovative thinking and groundbreaking research.

Latest Patents

Nonaka's latest innovations include a negative resist composition and a resist material specifically designed for advanced lithography techniques. The first patent describes a negative resist composition that includes a base polymer and a uniquely formulated quencher comprising a sulfonium salt. This composition is engineered to enhance resolution and improve line width roughness (LWR) in organic solvent development processes.

His second patent details a resist material comprised of a metal compound condensate, a photo-acid generator, and a basic compound. This innovative material is particularly well-suited for extreme ultraviolet (EUV) and electron beam lithography applications, providing high sensitivity and resolution.

Career Highlights

Hiroki Nonaka is associated with Shin-Etsu Chemical Co., Ltd., a leading firm in the chemical industry. His work has not only advanced the field of resist materials but has also ensured that Shin-Etsu remains at the forefront of technological advancements in lithography.

Collaborations

Throughout his career, Nonaka has collaborated closely with notable coworkers such as Tomohiro Kobayashi and Tsukasa Watanabe. Their combined expertise has led to numerous advancements in the development of high-performance resist materials.

Conclusion

Hiroki Nonaka's contributions to the innovation of resist materials and patterning processes have solidified his status as a key figure in the field. His patents reflect a commitment to excellence and a vision for the future of lithography technologies. As advancements continue, Nonaka remains a vital player in shaping the landscape of innovation in this sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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