Inagi, Japan

Hiroki Inoue

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Frontech Limited. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroki Inoue. Retrieved from https://idiyas.com/inventor/hiroki-inoue-ydwn90uf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Hiroki Inoue: Innovator in Character Recognition Technology

Introduction

Hiroki Inoue is a notable inventor based in Inagi, Japan. He has made significant contributions to the field of character recognition technology. His innovative approach aims to enhance the accuracy of character recognition systems.

Latest Patents

Hiroki Inoue holds 1 patent for a character recognition apparatus and method. The objective of this invention is to eliminate dotted lines in a character box within image data, thereby increasing the character recognition rate. The invention addresses challenges where dotted line candidates cannot be extracted due to overlapping parts or blurriness. By estimating the position of a dotted line candidate based on features such as interval, length, and width, the system can compare image data to determine if they are identical.

Career Highlights

Hiroki Inoue is currently employed at Fujitsu Frontech Limited, where he continues to develop innovative solutions in character recognition. His work has been instrumental in advancing the capabilities of image processing technologies.

Collaborations

Hiroki collaborates with talented coworkers, including Shinichi Eguchi and Maki Yabuki. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Hiroki Inoue's contributions to character recognition technology exemplify the impact of innovative thinking in solving complex problems. His work continues to influence advancements in the field, showcasing the importance of collaboration and creativity in technology development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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