Kanazawa Ishikawa, Japan

Hiroki Hatada

USPTO Granted Patents = 1 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hiroki Hatada: Innovator in Semiconductor Technology

Introduction

Hiroki Hatada is a notable inventor based in Kanazawa, Ishikawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly with his innovative designs that enhance device performance. His work has garnered attention in the industry, showcasing his expertise and creativity.

Latest Patents

Hiroki Hatada holds a patent for a semiconductor device with multiple electrodes and an insulation film. This semiconductor device features a second electrode located in a semiconductor part, extending in a first direction. It also includes a third electrode with distinct portions and a fourth electrode positioned above the semiconductor part. The design aims to improve the functionality and efficiency of semiconductor devices.

Career Highlights

Throughout his career, Hiroki Hatada has worked with prominent companies in the technology sector. He has been associated with Toshiba Corporation and Toshiba Electronic Devices & Storage Corporation. His experience in these organizations has allowed him to develop and refine his skills in semiconductor technology.

Collaborations

Hiroki has collaborated with various professionals in his field, including his coworker Kohei Oasa. These collaborations have contributed to the advancement of semiconductor innovations and have fostered a creative environment for developing new technologies.

Conclusion

Hiroki Hatada's contributions to semiconductor technology through his patent and career experiences highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in semiconductor devices.

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