Tokyo, Japan

Hirokazu Fujimura

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2012-2021

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7 patents (USPTO):Explore Patents

Title: Innovations of Hirokazu Fujimura

Introduction

Hirokazu Fujimura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced porous membranes. With a total of seven patents to his name, Fujimura's work has had a substantial impact on filtering applications.

Latest Patents

Fujimura's latest patents include a groundbreaking porous membrane that boasts high water permeability, excellent blocking performance, and durability against long-term and high operation pressures. This innovative membrane is designed for filtering applications and features a unique structure where one surface is oriented towards the filtrate and the other towards the liquid being filtered. The surface pore diameter index of the membrane is 2.5 or more, indicating its advanced filtering capabilities. Another notable patent involves a porous membrane with a thickness of 150 micrometers or greater, where the pore diameters of the first surface are smaller than those of the second surface. The average pore diameter of the first surface is 60 nanometers or less, with a coefficient of variation between 10% and 50%.

Career Highlights

Fujimura has worked with leading companies in the industry, including Asahi Kasei Chemicals Corporation and Asahi Kasei Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in material development and innovation.

Collaborations

Fujimura has collaborated with notable colleagues such as Masatoshi Hashino and Noboru Kubota. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Hirokazu Fujimura's contributions to the field of porous membranes exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving filtering applications, making a lasting impact in the industry.

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