Tokyo, Japan

Hirokatsu Hattanda

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Yogyo Kabushiki Kaisha. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirokatsu Hattanda. Retrieved from https://idiyas.com/inventor/hirokatsu-hattanda-3utu7bwm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Hirokatsu Hattanda: Innovator in Liquid Metal Technology

Introduction

Hirokatsu Hattanda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of liquid metal technology, particularly through his innovative designs and patents. His work focuses on improving the efficiency and effectiveness of metal pouring processes.

Latest Patents

Hattanda holds a patent for a gas injection nozzle designed for pouring liquid metal. The primary objective of this invention is to prevent the nozzle from becoming blocked during continuous casting. This advancement is crucial for enhancing the reliability and performance of metal pouring operations.

Career Highlights

Hattanda is associated with Tokyo Yogyo Kabushiki Kaisha, where he has been instrumental in developing new technologies. His expertise in liquid metal applications has positioned him as a key figure in his field. With a total of 1 patent, he continues to push the boundaries of innovation.

Collaborations

Hattanda has worked alongside talented colleagues, including Mitsukazu Ogiso and Yasuta Koike. Their collaborative efforts have contributed to the advancement of technologies in the metal industry.

Conclusion

Hirokatsu Hattanda's contributions to liquid metal technology through his innovative patent demonstrate his commitment to enhancing industrial processes. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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