Company Filing History:
Years Active: 1984
Title: Hiroji Saida: Innovator in Microwave Plasma Etching
Introduction
Hiroji Saida is a prominent inventor based in Kokubunji, Japan. He has made significant contributions to the field of plasma etching technology, holding 2 patents that showcase his innovative approach to semiconductor processing.
Latest Patents
One of his latest patents is a microwave plasma etching system. This system includes a vacuum chamber designed to provide a discharge space, equipped with an inlet for introducing a discharge gas that contains a fluorine-containing gas, hydrogen, and oxygen. The system also features magnetic field forming means to create a magnetic field in the discharge space and microwave electric field forming means to establish a microwave electric field. The substrates holding means is designed to hold substrates for processing within the vacuum chamber. This technology allows for excellent etching that is almost free from side etching, utilizing a discharge gas that includes fluorine and hydrogen, with or without oxygen.
Another notable patent focuses on the uniform etching of silicon, both doped and undoped. In this process, multiple silicon regions with varying impurity concentrations are subjected to dry etching. The method ensures that neutral particles in the plasma do not significantly participate in the etching process, allowing etching to be performed primarily by ions. This innovation enables the silicon regions to be etched at nearly the same rate, regardless of their impurity concentration.
Career Highlights
Hiroji Saida is associated with Hitachi, Ltd., where he has been instrumental in advancing plasma etching technologies. His work has contributed to the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable colleagues, including Shigeru Nishimatsu and Keizo Suzuki, to further enhance the development of innovative technologies in his field.
Conclusion
Hiroji Saida's contributions to microwave plasma etching represent a significant advancement in semiconductor technology. His patents reflect a commitment to innovation and excellence in the field.