Hikone, Japan

Hirofumi Nishimuta

This inventor holds 1 USPTO granted patent. Top assignee: Toagosei Chemical Industry, Co., Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hirofumi Nishimuta. Retrieved from https://idiyas.com/inventor/hirofumi-nishimuta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Hirofumi Nishimuta: Innovator in Curable Compositions

Introduction

Hirofumi Nishimuta is a notable inventor based in Hikone, Japan. He has made significant contributions to the field of curable compositions, particularly in the production of shadow masks. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.

Latest Patents

Hirofumi Nishimuta holds a patent for a "Curable composition and process for producing shadow mask using the same." This patent involves a curable composition comprising various components, which are essential for the effective production of shadow masks. His invention is a testament to his dedication to advancing technology in this area.

Career Highlights

Nishimuta is associated with Toagosei Chemical Industry, Co., Ltd., where he applies his knowledge and skills to further his research and development efforts. His work at this esteemed company has allowed him to explore innovative solutions and contribute to the chemical industry.

Collaborations

Throughout his career, Hirofumi has collaborated with talented individuals such as Ichiro Igarashi and Hiroshi Sasaki. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Hirofumi Nishimuta is a distinguished inventor whose work in curable compositions has made a significant impact in his field. His patent and collaborations reflect his commitment to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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