Hirofumi Fukunaga

Title: Hirofumi Fukunaga: Innovator in Complex Oxide Films and Capacitors

Introduction

Hirofumi Fukunaga is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of materials science, particularly in the development of complex oxide films and capacitors. With a total of 2 patents to his name, Fukunaga's work has implications for various electronic devices.

Latest Patents

Fukunaga's latest patents include a method for producing a complex oxide film with a high relative dielectric constant. This method involves a wet-treatment process that includes washing the complex oxide film with an acid solution of pH 5 or less to reduce salts in the film. Additionally, he has developed a dielectric material and a piezoelectric material that incorporate this complex oxide film, along with a capacitor and piezoelectric element that utilize these materials. Another significant patent involves a production process for niobium capacitors, which exposes the dielectric oxide layer to temperatures ranging from 100 to 1,400°C. This process results in capacitors with excellent LC properties and minimal reduction in capacitance due to DC bias.

Career Highlights

Fukunaga is currently employed at Showa Denko K.K., where he continues to innovate in the field of electronic materials. His work has been instrumental in advancing the technology behind capacitors and piezoelectric elements, which are critical components in modern electronic devices.

Collaborations

Fukunaga has collaborated with notable colleagues such as Kazuhiro Omori and Kazumi Naito. Their combined expertise has contributed to the successful development of innovative materials and processes in their field.

Conclusion

Hirofumi Fukunaga's contributions to the field of materials science, particularly in complex oxide films and capacitors, highlight his role as a significant inventor. His patents reflect a commitment to advancing technology in electronic devices, making a lasting impact on the industry.