Tokyo, Japan

Hiroaki Narusima


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Hiroaki Narusima: Innovator in Substrate Processing Technology

Introduction

Hiroaki Narusima is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to substrate processing technology, particularly in the field of semiconductor manufacturing. His innovative approach has led to advancements that enhance the efficiency and quality of substrate handling.

Latest Patents

Hiroaki Narusima holds a patent for a substrate transport apparatus, substrate holding apparatus, and substrate processing apparatus. This invention features spoke-shaped (petal-shaped) through holes or cavities located at the center of a substrate holder. The design allows for the vertical movement of a center-up member with multiple radially extended spoke-shaped mounting portions. This innovation minimizes degradation in the flatness of a substrate during the attachment process to the mounting surface of the substrate holder. He has 1 patent to his name.

Career Highlights

Narusima is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has positioned him at the forefront of technological advancements in substrate processing, contributing to the company's reputation for innovation and quality.

Collaborations

Hiroaki Narusima collaborates with Shinji Mizutani, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the development of cutting-edge technologies in substrate handling and processing.

Conclusion

Hiroaki Narusima's contributions to substrate processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and work at Nikon Corporation highlight his commitment to advancing technology and improving manufacturing processes.

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