JP

Hiroaki Iwasaki

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroaki Iwasaki. Retrieved from https://idiyas.com/inventor/hiroaki-iwasaki-6k5kabv8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: Hiroaki Iwasaki: Innovator in Electrophotography

Introduction

Hiroaki Iwasaki is a notable inventor from Japan, recognized for his contributions to the field of electrophotography. His innovative work has focused on developing advanced materials that enhance the performance of photosensitive devices.

Latest Patents

Hiroaki Iwasaki holds a patent for a laminate type photosensitive material for electrophotography. This invention comprises a charge-generating layer and a charge-transporting layer formed on an electroconductive substrate. The charge-transporting layer includes a first charge-transporting material with an ionization potential smaller than that of the charge-generating material and a second charge-transporting material with a larger ionization potential. This combination allows for improved residual potential and stability during repeated use, enhancing the charging capacity of the material.

Career Highlights

Throughout his career, Hiroaki Iwasaki has worked with various companies, contributing his expertise to the development of innovative technologies. His work has significantly impacted the field of electrophotography, showcasing his commitment to advancing this technology.

Collaborations

Hiroaki Iwasaki has collaborated with notable individuals in his field, including Youichi Takesawa and Hiroshi Takemoto. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Hiroaki Iwasaki's contributions to electrophotography demonstrate his innovative spirit and dedication to advancing technology. His work continues to influence the industry, paving the way for future advancements in photosensitive materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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