Yokohama, Japan

Hiroaki Imamura

This inventor holds 1 USPTO granted patent. Top assignee: Jsw Aktina System Co., Ltd. Active years: 2026.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hiroaki Imamura: Innovator in Laser Processing Technology

Introduction

Hiroaki Imamura is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative laser processing technologies. His work focuses on enhancing the efficiency and effectiveness of laser applications in semiconductor films.

Latest Patents

Hiroaki Imamura holds a patent for a "Laser processing apparatus, laser processing method, and method for manufacturing semiconductor apparatus." This invention provides a laser processing apparatus designed to effectively prevent an increase in processing time for semiconductor films. The apparatus includes a laser light source that irradiates the semiconductor film with a laser beam, a film state measuring instrument that assesses the state of the film post-irradiation, and a laser light adjusting mechanism that modifies the timing and intensity of the laser beam based on the measured state of the semiconductor film.

Career Highlights

Hiroaki Imamura is associated with Jsw Aktina System Co., Ltd., where he applies his expertise in laser processing technologies. His innovative approach has led to advancements in semiconductor manufacturing processes, making them more efficient and reliable.

Collaborations

Hiroaki has collaborated with notable colleagues, including Naoyuki Kobayashi and Masashi Machida. Their combined efforts contribute to the ongoing development of cutting-edge technologies in the semiconductor industry.

Conclusion

Hiroaki Imamura's contributions to laser processing technology have made a significant impact on the semiconductor manufacturing sector. His innovative patent and collaborative efforts continue to drive advancements in this critical field.

Profile summary based on public USPTO records.
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