Hiroaki Hosokawa

Title: Hiroaki Hosokawa: Innovator in Exposure Condition Measurement

Introduction

Hiroaki Hosokawa is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of exposure condition measurement, particularly in the context of photolithography.

Latest Patents

Hiroaki Hosokawa holds a patent for an "Exposure condition measurement method." This innovative method involves measuring the conditions for exposing a pattern formed on a mask onto a photosensitive substrate. The process includes successively exposing first patterns at various positions on the mask onto multiple partial regions of the substrate while altering the exposure conditions. Additionally, second patterns are exposed onto portions of the latent image of the first patterns, also while changing the exposure conditions. The method ultimately detects a predetermined state where a resist image is formed on the resist layer after development, allowing for accurate measurement of the exposure condition.

Career Highlights

Hiroaki Hosokawa is associated with Nikon Corporation, a leading company in imaging and optical products. His work has contributed to advancements in photolithography techniques, which are essential in the manufacturing of semiconductors and other high-precision applications.

Collaborations

Hiroaki has collaborated with notable colleagues, including Norihiko Takatsu and Kyoichi Suwa. Their combined expertise has furthered the development of innovative technologies in their field.

Conclusion

Hiroaki Hosokawa's contributions to exposure condition measurement highlight his role as an influential inventor in the technology sector. His patent and work at Nikon Corporation demonstrate his commitment to advancing photolithography techniques.