Hiroaki Fukui

Title: Hiroaki Fukui: Innovator in Antireflection Technology

Introduction

Hiroaki Fukui is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of optical technology, particularly through his innovative patent related to antireflection structures.

Latest Patents

Hiroaki Fukui holds a patent for an antireflection structure and its manufacturing method. This invention features a transparent substrate with multiple holes that have U-shaped or V-shaped cross-sections. The design includes a metal oxide film that is strategically placed on the substrate's surface and within the holes. The specifications of the patent detail that the average diameter of the openings ranges from 50 nm to 300 nm, with the distance between adjacent holes being 100 nm to 400 nm. Additionally, the depth of each hole varies from 80 nm to 250 nm, and the thickness of the metal oxide film increases with the depth of the holes, effectively minimizing depth discrepancies.

Career Highlights

Throughout his career, Hiroaki Fukui has worked with esteemed organizations such as the National Institute of Advanced Industrial Science and Technology and Mitsubishi Gas Chemical Trading, Inc. His experience in these institutions has allowed him to refine his expertise in materials science and optical engineering.

Collaborations

Hiroaki has collaborated with notable colleagues, including Kazuma Kurihara and Ryohei Hokari. Their joint efforts have contributed to advancements in the field of optical technologies.

Conclusion

Hiroaki Fukui's innovative work in antireflection technology showcases his dedication to advancing optical materials. His contributions are significant in enhancing the performance of optical devices, and his patent reflects a deep understanding of material properties and engineering principles.