Hiral D Tailor

Title: Hiral D Tailor: Innovator in Semiconductor Processing

Introduction

Hiral D Tailor is a notable inventor based in Portland, OR (US), recognized for his contributions to semiconductor processing. With a focus on improving the efficiency and effectiveness of semiconductor manufacturing, Tailor has made significant strides in the field.

Latest Patents

Hiral D Tailor holds a patent for "Treatments for controlling deposition defects." This innovative patent outlines exemplary methods of semiconductor processing, which include forming a plasma of a carbon-containing precursor in a processing region of a semiconductor processing chamber. The methods also involve depositing a carbon-containing material on a substrate housed in the processing region. Additionally, the process includes halting the flow of the carbon-containing precursor and contacting the carbon-containing material with plasma effluents of an oxidizing material. Ultimately, these methods aim to form volatile materials from the surface of the carbon-containing material.

Career Highlights

Hiral D Tailor is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on advancing semiconductor processing techniques, which are crucial for the development of modern electronic devices.

Collaborations

Some of Hiral D Tailor's coworkers include Sudha S Rathi and Ganesh Balasubramanian, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Hiral D Tailor's work in semiconductor processing exemplifies the importance of innovation in technology. His patent and contributions to the field highlight his role as a key inventor in advancing semiconductor manufacturing techniques.