St. Nicholas, United Kingdom

Hilke Donohue

This inventor holds 1 USPTO granted patent. Top assignee: Trikon Holdings Limited. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hilke Donohue. Retrieved from https://idiyas.com/inventor/hilke-donohue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Hilke Donohue: Innovator in Tantalum Film Technology

Introduction

Hilke Donohue is a prominent inventor based in St. Nicholas, GB. She has made significant contributions to the field of materials science, particularly in the deposition of tantalum films. Her innovative work has implications for various applications, including electroplating processes.

Latest Patents

Hilke Donohue holds a patent for a method of depositing a tantalum film, where α-Ta dominates. This invention details a process for electroplating copper using tantalum films that are less than 300 nm thick. The films are created by depositing a seed layer of an organic low dielectric constant insulating layer and sputtering tantalum onto this layer at temperatures below 250°C.

Career Highlights

Hilke is currently associated with Trikon Holdings Limited, where she applies her expertise in materials science. Her work at the company has been instrumental in advancing technologies related to semiconductor manufacturing and other high-tech applications.

Collaborations

[This section has been skipped due to space constraints.]

Conclusion

Hilke Donohue's contributions to tantalum film technology exemplify her innovative spirit and dedication to advancing materials science. Her work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…