Kanagawa, Japan

Hikaru Fukazawa

This inventor holds 2 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Ricoh Company, Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hikaru Fukazawa. Retrieved from https://idiyas.com/inventor/hikaru-fukazawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Hikaru Fukazawa

Introduction

Hikaru Fukazawa is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of liquid discharge technology. His work is characterized by a focus on enhancing the efficiency and reliability of liquid application systems.

Latest Patents

Fukazawa holds a patent for a "Liquid discharge apparatus, liquid discharge method, and storage medium." This innovative apparatus is designed to apply liquid to an application surface using a head and processing circuitry. The head discharges liquid from a nozzle onto the surface, while the processing circuitry monitors and outputs abnormal discharge information based on the shape of the liquid applied.

Career Highlights

Hikaru Fukazawa is currently employed at Ricoh Company, Ltd., where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of liquid discharge systems, making them more effective for various applications.

Collaborations

Fukazawa collaborates with talented colleagues, including Takahiko Sugiura and Takayuki Ito. Together, they contribute to the innovative environment at Ricoh Company, Ltd., pushing the boundaries of technology.

Conclusion

Hikaru Fukazawa's contributions to liquid discharge technology exemplify the spirit of innovation. His patent and ongoing work at Ricoh Company, Ltd. highlight his commitment to advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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