Osaka, Japan

Hideyuki Uemura

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: General Company Limited. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyuki Uemura. Retrieved from https://idiyas.com/inventor/hideyuki-uemura-i8d8b3nu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideyuki Uemura

Introduction

Hideyuki Uemura is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of inkjet technology. His work focuses on developing innovative ink formulations that enhance printing quality and efficiency.

Latest Patents

Uemura holds a patent for an inkjet ink and a hiding layer coating agent. This invention includes radical polymerizable components, such as a polyfunctional monomer with a glass transition temperature of not less than 40°C. The formulation is designed to provide excellent dispersion stability without the use of white pigments, enabling the printing of high-quality white or colored characters.

Career Highlights

Throughout his career, Uemura has worked with prominent companies, including General Company Limited and Seiko Epson Corporation. His experience in these organizations has allowed him to refine his expertise in inkjet technology and contribute to advancements in the field.

Collaborations

Uemura has collaborated with notable colleagues, including Kengo Nagae and Masayuki Matsubara. These partnerships have fostered innovation and the sharing of ideas within the industry.

Conclusion

Hideyuki Uemura's contributions to inkjet technology exemplify the impact of innovative thinking in the field of printing. His patent and collaborations highlight the importance of continuous development in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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