Kyoto, Japan

Hideyuki Muroi

This inventor holds 1 USPTO granted patent. Top assignee: Nissha Printing Co., Ltd.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyuki Muroi. Retrieved from https://idiyas.com/inventor/hideyuki-muroi-l110wq33

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideyuki Muroi

Hideyuki Muroi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of touch panel technology. His innovative approach has led to the development of a unique touch panel capable of wide-area inputting.

Latest Patents

Muroi holds a patent for a touch panel that allows a larger amount of input operations to be made with a single display operation. This technology features at least one bus bar and a transparent electrode on a conductive panel, which face each other through spaces formed in an adhesive layer. This design enables electrical contact by pressing, enhancing the functionality of touch panels.

Career Highlights

Muroi is associated with Nissha Printing Co., Ltd., where he continues to work on advancing touch panel technologies. His career is marked by a commitment to innovation and improving user interaction with technology.

Collaborations

Some of his coworkers include Yasuji Kusuda and Jun Shimizu, who contribute to the collaborative environment at Nissha Printing Co., Ltd. Their teamwork fosters creativity and innovation in their projects.

Conclusion

Hideyuki Muroi's contributions to touch panel technology exemplify the spirit of innovation. His patent for a wide-area inputting touch panel showcases his ability to enhance user experience through technology. Muroi's work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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