This inventor holds 1 USPTO granted patent and 5 published patent applications and 1 EPO patent. Top assignee: Kurita Water Industries Ltd.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Innovations of Hideyuki Komori
Introduction
Hideyuki Komori is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of etching solutions, particularly in the semiconductor industry. His innovative methods have the potential to enhance the efficiency and sustainability of etching processes.
Latest Patents
Komori holds a patent for a method for treating etching solutions. This method focuses on the circulation and reuse of etching solutions used in the etching treatment of silicon. The patent outlines two key approaches: selectively removing multivalent ions with a valence of two or more, or removing a specific percentage of alkali metal ions and hydroxide ions through a membrane separation unit that utilizes a nanofiltration membrane. The permeated solution from this unit is then circulated back to the etching bath, promoting a more sustainable process.
Career Highlights
Throughout his career, Komori has worked with prominent companies such as Kurita Water Industries Ltd. and Hitachi-GE Nuclear Energy, Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in etching solutions.
Collaborations
Komori has collaborated with notable colleagues, including Nobuhiro Orita and Shingo Miyamoto. These partnerships have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Hideyuki Komori's contributions to the field of etching solutions demonstrate his commitment to innovation and sustainability. His patented methods have the potential to significantly impact the semiconductor industry, making processes more efficient and environmentally friendly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
