Osaka, Japan

Hideyuki Karita

This inventor holds 2 USPTO granted patents. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 2015-2017.


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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2 patents (USPTO):Explore Patents

Title: Innovations by Hideyuki Karita

Introduction

Hideyuki Karita is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of technology, particularly in the development of fine particle diffusion devices. With a total of 2 patents, his work reflects a commitment to enhancing living environments through innovative solutions.

Latest Patents

One of Karita's latest patents is a fine particle diffusion device. This device includes a first outlet through which a first air current is discharged to a space above a living space within a living room. Additionally, it features a second outlet arranged below the first outlet, which discharges a second air current to a space below the first air current. The device also incorporates a fine particle generation mechanism that produces fine particles. Notably, the concentration of fine particles discharged through the first outlet is lower than that of the second outlet, ensuring a balanced distribution of particles in the living space.

Career Highlights

Karita is associated with Sharp Kabushiki Kaisha Corporation, a leading company in the electronics industry. His work at Sharp has allowed him to focus on innovative technologies that improve air quality and enhance user experience in residential settings.

Collaborations

Karita collaborates with Masaki Ohtsuka, a fellow innovator, to further advance their projects and share insights in their respective fields.

Conclusion

Hideyuki Karita's contributions to the field of fine particle diffusion devices exemplify his dedication to innovation and improving living conditions. His patents reflect a forward-thinking approach that benefits both consumers and the environment.

Profile summary based on public USPTO records.
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