Katsuta, Japan

Hideyuki Kakiuchi


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1985-1992

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2 patents (USPTO):Explore Patents

Title: Innovations of Hideyuki Kakiuchi

Introduction

Hideyuki Kakiuchi is a notable inventor based in Katsuta, Japan. He has made significant contributions to the field of electron beam lithography and charged particle beam technology. With a total of 2 patents, Kakiuchi's work has advanced the precision and efficiency of these technologies.

Latest Patents

Kakiuchi's latest patents include an "Electron beam lithography apparatus having device for correcting beam" and a "Charged particle beam apparatus." The electron beam lithography apparatus features an upper and lower aperture, a deflector, and an optical lens that converges the electron beam onto a specimen. This apparatus measures reflected electrons from a position mark, calculates correction values, and controls the deflector for high-accuracy corrections of the electron beam's sectional shapes. The charged particle beam apparatus focuses a beam of charged particles on a target through multiple aperture members, each combined with a deflecting unit for two-dimensional scanning. The apparatus determines the center axis of the aperture based on the quantity of charged particles trapped during scanning and adjusts to cancel out any deviations.

Career Highlights

Kakiuchi is currently employed at Hitachi, Ltd., where he continues to innovate in the field of charged particle technology. His work has been instrumental in enhancing the capabilities of electron beam lithography, which is crucial for semiconductor manufacturing and other high-precision applications.

Collaborations

Kakiuchi has collaborated with notable coworkers such as Yoshimasa Shimura and Yoshihisa Minamikawa. Their combined expertise has contributed to the advancements in the technologies they work on.

Conclusion

Hideyuki Kakiuchi's contributions to electron beam lithography and charged particle beam technology demonstrate his innovative spirit and commitment to advancing these fields. His patents reflect a deep understanding of the complexities involved in precision engineering.

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