Hitachi, Ltd.

Hideyuki Kakiuchi

Kazumitsu Nakamura

Katsuhiro Kawasaki

Yoshihisa Minamikawa

Yoshimasa Shimura

An electron beam lithography apparatus comprising an upper aperture, a lower aperture, a deflector disposed between the upper aperture and the lower aperture, an optical lens for converging the electron beam passed through the lower aperture onto a specimen, and means for measuring an electron reflected from a position mark installed on a stage when the electron beam scans the position mark, calculating a correction value of the section and the measured reflectional electron and controlling the deflector according to the correction value. As the shapes of the electron beam are corrected by detecting the reflectional electron from the position mark and measuring the positional error of the sectional shape of the electron beam corresponding to the set sectional shapes, the sectional shapes are corrected in high accuracy.

Electron beam lithography apparatus having device for correcting beam

A charged particle beam apparatus in which a beam of charged particles emitted from a beam source is focussed on a target in a predetermined size and shape through a plurality of aperture members. Each of the aperture members is combined with a respective deflecting unit which effects a two-dimensional scan with the charged particle beam in response to a scan signal supplied thereto. The center axis of the aperture formed in the aperture member is arithmetically determined on the basis of time-based variation in the quantity of the charged particles trapped by the aperture member during the scan operation. Further, deviation of the arithmetically determined center axis of the aperture from a reference axis is determined. The aperture member is slided on a plane extending perpendicularly to the center axis of the aperture to cancel out the deviation.

Growing community of inventors

Katsuta, Japan

Hideyuki Kakiuchi