Osaka, Japan

Hideyuki Fujita

This inventor holds 1 USPTO granted patent. Top assignee: Nippon Sheet Glass Company, Limited. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyuki Fujita. Retrieved from https://idiyas.com/inventor/hideyuki-fujita-k4ipd1lo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Innovations by Hideyuki Fujita

Introduction

Hideyuki Fujita is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of glass cutting technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of plate-glass cutters.

Latest Patents

Fujita holds a patent for a "Blank layout method for plate-glass cutters." This invention is designed to optimize the layout process, ensuring that glass is cut with minimal waste and maximum precision. He has 1 patent to his name, showcasing his expertise in this specialized area.

Career Highlights

Fujita is currently employed at Nippon Sheet Glass Company, Limited, where he continues to work on advancements in glass technology. His role at the company allows him to apply his innovative ideas in a practical setting, contributing to the company's reputation as a leader in the glass industry.

Collaborations

Throughout his career, Fujita has collaborated with talented individuals such as Mitsunori Kawabe and Masaharu Okafuji. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Hideyuki Fujita's contributions to the field of glass cutting technology exemplify the impact of innovation in industry. His patent and work at Nippon Sheet Glass Company, Limited highlight his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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