Shinshiro, Japan

Hideyo Ando

This inventor holds 1 USPTO granted patent. Top assignee: Ishihara Sangyo Kaisha, Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyo Ando. Retrieved from https://idiyas.com/inventor/hideyo-ando

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideyo Ando

Introduction

Hideyo Ando is a notable inventor based in Shinshiro, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative coating agents. His work focuses on enhancing the properties of materials used in various applications.

Latest Patents

Hideyo Ando holds a patent for a near-infrared shielding coating agent that is curable at ordinary temperatures. This invention includes a unique formulation that consists of an inorganic near-infrared absorbing agent, a tetrafunctional silicon compound, a trifunctional silicon compound, a silane coupling agent, and a solvent. The coating agent allows for the formation of a near-infrared shielding film that exhibits high film hardness and is resistant to cracking, even when applied at temperatures ranging from 5°C to 40°C.

Career Highlights

Hideyo Ando is currently associated with Ishihara Sangyo Kaisha, Ltd., where he continues to innovate and develop new materials. His expertise in the field has led to advancements that benefit various industries, particularly those requiring specialized coatings.

Collaborations

Hideyo Ando has collaborated with notable colleagues, including Yoichi Ishibai and Akihito Sakai. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Hideyo Ando's contributions to the field of materials science, particularly through his innovative patent, demonstrate his commitment to advancing technology. His work continues to influence the development of new materials that meet the demands of modern applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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