Kamakura, Japan

Hidetoshi Noda

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Toray Industries, Inc.. Active years: 2012-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidetoshi Noda. Retrieved from https://idiyas.com/inventor/hidetoshi-noda-rdyj0260

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2012-2013

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2 patents (USPTO):Explore Patents

Title: Hidetoshi Noda: Innovator in Pharmaceutical Chemistry

Introduction

Hidetoshi Noda is a prominent inventor based in Kamakura, Japan. He has made significant contributions to the field of pharmaceutical chemistry, particularly through his innovative work on cyclohexane derivatives. With a total of 2 patents, Noda's inventions focus on alleviating pain with fewer side effects.

Latest Patents

Noda's latest patents include a method that relieves both nociceptive pain and neuropathic pain while minimizing side effects. The compound involves cyclohexane derivatives, which are represented by specific chemical structures or their pharmaceutically acceptable salts and prodrugs. Another patent highlights a compound that exhibits strong analgesic action against both types of pain, further emphasizing its medical utility.

Career Highlights

Hidetoshi Noda is associated with Toray Industries, Inc., where he continues to advance his research and development efforts. His work has garnered attention for its potential impact on pain management therapies.

Collaborations

Noda collaborates with notable colleagues, including Yasuhiro Morita and Katsuhiko Iseki, who contribute to his research endeavors.

Conclusion

Hidetoshi Noda's innovative work in pharmaceutical chemistry showcases his commitment to developing effective pain relief solutions. His contributions are poised to make a significant impact in the medical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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