Location History:
- Niigata, JP (1996 - 1999)
- Niigata-ken, JP (1999)
- Katsushika-ku, JP (2022)
Company Filing History:
4 out of 2,248 
1 out of 6 Years Active: 1996-2022
Certainly! Here is an article about inventor Hidetoshi Ikeda:
Title: Unveiling the Innovations of Inventor Hidetoshi Ikeda
Introduction: Hidetoshi Ikeda, a prolific inventor hailing from Niigata, Japan, has made significant contributions to the field of semiconductor device production through his patented innovations.
Latest Patents:
1. Method and system for producing purified aqueous hydrogen peroxide solution: Ikeda's method and system efficiently produce a high-purity aqueous hydrogen peroxide solution, involving steps for vaporization, condensation, separation, and concentration adjustment.
2. Cleaning liquid for semiconductor devices: Ikeda's cleaning liquid formulation for semiconductor devices includes fluorine-containing compounds, organic solvents, inorganic/organic acids, and specific salts, enabling the removal of deposit polymer without compromising film integrity.
Career Highlights: Hidetoshi Ikeda's inventive prowess shines at Mitsubishi Gas Chemical Company, Inc., where he continues to drive advancements in semiconductor device technologies with five patented innovations.
Collaborations: Ikeda's collaborative spirit is evident through his work with esteemed colleagues Ryuji Hasemi and Tetsuo Aoyama, collectively shaping groundbreaking solutions in the semiconductor industry.
Conclusion: In conclusion, Hidetoshi Ikeda stands as a remarkable inventor whose pioneering work in producing purified aqueous hydrogen peroxide solutions and formulating cutting-edge cleaning liquids for semiconductor devices underscores his commitment to innovation and excellence in the field.