Fujisawa, Japan

Hidetoshi Ichinose

This inventor holds 1 USPTO granted patent. Top assignee: Ushio Denki Kabushiki Kaisha. Active years: 1991.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Hidetoshi Ichinose: Innovator in Fused Silica Technology

Introduction

Hidetoshi Ichinose is a notable inventor based in Fujisawa, Japan. He has made significant contributions to the field of materials science, particularly in the production of fused silica envelopes for discharge lamps. His innovative methods have paved the way for advancements in lighting technology.

Latest Patents

Ichinose holds a patent for a "Method for producing a fused silica envelope for discharge lamp." This method involves coating the inner surface of a fused silica tube with a formulation containing titanium alcoholate. The coating undergoes a baking process at a temperature of at least 1720°C, allowing TiO₂ to diffuse into the tube. The resulting titanium concentration ranges from 0.5% to 7% in terms of TiO₂, with an overall average Ti concentration and wall thickness ranging from 3.7% μm to 42% μm. The method also includes shaping the tube into a bulb-like portion by inflating the silica tube during the baking step.

Career Highlights

Hidetoshi Ichinose is associated with Ushio Denki Kabushiki Kaisha, a company known for its innovations in lighting technology. His work has been instrumental in enhancing the performance and efficiency of discharge lamps.

Collaborations

Ichinose has collaborated with notable colleagues, including Keisuke Ohkubo and Toshiyuki Okamoto. Their combined expertise has contributed to the successful development of advanced lighting solutions.

Conclusion

Hidetoshi Ichinose's innovative methods in producing fused silica envelopes have significantly impacted the lighting industry. His contributions continue to influence advancements in technology and materials science.

Profile summary based on public USPTO records.
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